Interfacial dynamics of GaP/Si(100) heterostructure grown by molecular beam epitaxy

被引:2
作者
Wei, Tieshi [1 ,2 ]
Li, Xuefei [1 ]
Li, Zhiyun [3 ]
Yang, Wenxian [1 ]
Wu, Yuanyuan [1 ]
Xing, Zhiwei [1 ]
Lu, Shulong [1 ]
机构
[1] Chinese Acad Sci, Suzhou Inst Nanotech & Nanob, Key Lab Nanodevices & Applicat, Suzhou 215123, Peoples R China
[2] Univ Sci & Technol China, Nano Sci & Technol Inst, Suzhou 215123, Peoples R China
[3] Chinese Acad Sci, Suzhou Inst Nanotech & Nanobion, Vacuum Interconnected Nanotech Workstn NANO X, Suzhou 215123, Peoples R China
基金
中国国家自然科学基金;
关键词
XPS; interfacial dynamics; GaP; Si(100) heterostructure; MBE; III-V; GAP(001); SI(100); ION; XPS;
D O I
10.1088/1674-4926/43/12/122101
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
The atomic structure and surface chemistry of GaP/Si(100) heterostructure with different pre-layers grown by molecular beam epitaxy are studied. It is found that GaP epilayer with Ga-riched pre-layers on Si(100) substrate has regular surface morphology and stoichiometric abrupt heterointerfaces from atomic force microscopes (AFMs) and spherical aberration-corrected transmission electron microscopes (ACTEMs). The interfacial dynamics of GaP/Si(100) heterostructure is investigated by X-ray photoelectron spectroscopy (XPS) equipped with an Ar gas cluster ion beam, indicating that Ga pre-layers can lower the interface formation energy and the bond that is formed is more stable. These results suggest that Ga-riched pre-layers are more conducive to the GaP nucleation as well as the epitaxial growth of GaP material on Si(100) substrate.
引用
收藏
页数:7
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