Non-degenerate n-type doping by hydrazine treatment in metal work function engineered WSe2 field-effect transistor

被引:39
作者
Lee, Inyeal [1 ,2 ]
Rathi, Servin [1 ,2 ]
Li, Lijun [1 ,2 ]
Lim, Dongsuk [3 ]
Khan, Muhammad Atif [1 ,2 ]
Kannan, E. S. [4 ]
Kim, Gil-Ho [1 ,2 ]
机构
[1] Sungkyunkwan Univ, SAINT, Samsung SKKU Graphene Ctr, Suwon 16419, South Korea
[2] Sungkyunkwan Univ, Sch Elect & Elect Engn, Suwon 16419, South Korea
[3] Sungkyunkwan Univ, Sch Adv Mat Sci & Engn, Suwon 16419, South Korea
[4] BITS PILANI, Dept Phys, Zuarinagar 403726, Goa, India
基金
新加坡国家研究基金会;
关键词
WSe2; n-doping; hydrazine treatment; metal work function; hysteresis; GRAPHENE; MOS2;
D O I
10.1088/0957-4484/26/45/455203
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
We report a facile and highly effective n-doping method using hydrazine solution to realize enhanced electron conduction in a WSe2 field-effect transistor (FET) with three different metal contacts of varying work functions-namely, Ti, Co, and Pt. Before hydrazine treatment, the Ti- and Co-contacted WSe2 FETs show weak ambipolar behaviour with electron dominant transport, whereas in the Pt-contacted WSe2 FETs, the p-type unipolar behaviour was observed with the transport dominated by holes. In the hydrazine treatment, a p-type WSe2 FET (Pt contacted) was converted to n-type with enhanced electron conduction, whereas highly n-doped properties were achieved for both Ti- and Co-contacted WSe2 FETs with on-current increasing by three orders of magnitude for Ti. All n-doped WSe2 FETs exhibited enhanced hysteresis in their transfer characteristics, which opens up the possibility of developing memories using transition metal dichalcogenides.
引用
收藏
页数:6
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