Solid solution strengthening in GaSb/GaAs: A mode to reduce the TD density through Be-doping

被引:15
作者
Gutierrez, M. [1 ]
Araujo, D. [1 ]
Jurczak, P. [2 ]
Wu, J. [2 ]
Liu, H. [2 ]
机构
[1] Univ Cadiz, Dept Mat Sci & Metallurg Engn, Puerto Real 11510, Spain
[2] UCL, Dept Elect & Elect Engn, London WC1E 7JE, England
基金
英国工程与自然科学研究理事会;
关键词
DISLOCATIONS; GASB; GAAS(001); MISFIT; GAAS; MOBILITY;
D O I
10.1063/1.4977489
中图分类号
O59 [应用物理学];
学科分类号
摘要
The need for a low bandgap semiconductor on a GaAs substrate for thermophotovoltaic applications has motivated research on GaSb alloys, in particular, the control of plastic relaxation of its active layer. Although interfacial misfit arrays offer a possibility of growing strain-free GaSb-based devices on GaAs substrates, a high density of threading dislocations is normally observed. Here, we present the effects of the combined influence of Be dopants and low growth temperature on the threading dislocation density observed by Transmission Electron Microscopy. The Be-related hardening mechanism, occurring at island coalescence, is shown to prevent dislocations to glide and hence reduce the threading dislocation density in these structures. The threading density in the doped GaSb layers reaches the values of seven times less than those observed in undoped samples, which confirms the proposed Be-related hardening mechanism. (C) 2017 Author(s). All article content, except where otherwise noted, is licensed under a Creative Commons Attribution (CC BY) license (http://creativecommons.org/licenses/by/4.0/).
引用
收藏
页数:4
相关论文
共 22 条
[1]  
[Anonymous], 2009, Transmission Electron Microscopy: A Textbook for Materials Science
[2]   Edge and screw dislocations as nonradiative centers in InGaN/GaN quantum well luminescence [J].
Cherns, D ;
Henley, SJ ;
Ponce, FA .
APPLIED PHYSICS LETTERS, 2001, 78 (18) :2691-2693
[3]   Internal quantum efficiency and nonradiative recombination coefficient of GaInN/GaN multiple quantum wells with different dislocation densities [J].
Dai, Q. ;
Schubert, M. F. ;
Kim, M. H. ;
Kim, J. K. ;
Schubert, E. F. ;
Koleske, D. D. ;
Crawford, M. H. ;
Lee, S. R. ;
Fischer, A. J. ;
Thaler, G. ;
Banas, M. A. .
APPLIED PHYSICS LETTERS, 2009, 94 (11)
[4]   Femtosecond response times and high optical nonlinearity in beryllium-doped low-temperature grown GaAs [J].
Haiml, M ;
Siegner, U ;
Morier-Genoud, F ;
Keller, U ;
Luysberg, M ;
Specht, P ;
Weber, ER .
APPLIED PHYSICS LETTERS, 1999, 74 (09) :1269-1271
[5]   Effect of dislocation density on thermal boundary conductance across GaSb/GaAs interfaces [J].
Hopkins, Patrick E. ;
Duda, John C. ;
Clark, Stephen P. ;
Hains, Christopher P. ;
Rotter, Thomas J. ;
Phinney, Leslie M. ;
Balakrishnan, Ganesh .
APPLIED PHYSICS LETTERS, 2011, 98 (16)
[6]   Strain relief by periodic misfit arrays for low defect density GaSb on GaAs [J].
Huang, SH ;
Balakrishnan, G ;
Khoshakhlagh, A ;
Jallipalli, A ;
Dawson, LR ;
Huffaker, DL .
APPLIED PHYSICS LETTERS, 2006, 88 (13)
[7]   Interfacial misfit array formation for GaSb growth on GaAs [J].
Huang, Shenghong ;
Balakrishnan, Ganesh ;
Huffaker, Diana L. .
JOURNAL OF APPLIED PHYSICS, 2009, 105 (10)
[8]   Structural Analysis of Highly Relaxed GaSb Grown on GaAs Substrates with Periodic Interfacial Array of 90A° Misfit Dislocations [J].
Jallipalli, A. ;
Balakrishnan, G. ;
Huang, S. H. ;
Rotter, T. J. ;
Nunna, K. ;
Liang, B. L. ;
Dawson, L. R. ;
Huffaker, D. L. .
NANOSCALE RESEARCH LETTERS, 2009, 4 (12) :1458-1462
[9]   Effects of beryllium doping into InGaAlAs metamorphic buffer on high-electron-mobility transistor structure [J].
Jo, SJ ;
Ihn, SG ;
Song, JI ;
Park, JG ;
Lee, DH .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2006, 45 (2A) :724-726
[10]   GaSb thermophotovoltaic cells grown on GaAs by molecular beam epitaxy using interfacial misfit arrays [J].
Juang, Bor-Chau ;
Laghumavarapu, Ramesh B. ;
Foggo, Brandon J. ;
Simmonds, Paul J. ;
Lin, Andrew ;
Liang, Baolai ;
Huffaker, Diana L. .
APPLIED PHYSICS LETTERS, 2015, 106 (11)