Two-dimension atom nano-lithograph via atom localization

被引：62

作者：

Jin, Luling ^{[1
]}

Sun, Hui ^{[1
]}

Niu, Yueping ^{[1
]}

Jin, Shiqi ^{[1
]}

Gong, Shangqing ^{[1
]}

机构：

[1] Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, State Key Lab High Field Laser Phys, Shanghai 201800, Peoples R China

来源：

JOURNAL OF MODERN OPTICS | 2009年 / 56卷 / 06期

关键词：

atom nano-lithograph; atom localization; NONLINEAR PHOTONIC LATTICES; INCOHERENT WHITE-LIGHT;

D O I：

10.1080/09500340802267134

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

We propose a method for a two-dimension atom nano-lithograph based on two-dimension atom localization. By applying two orthogonal standing-wave fields, the atoms can be localized on some special positions, leading to the formation of sub-wavelength two-dimension periodic patterns. The pattern topographies can be modified by adjusting the intensities of the standing wave fields.

引用

页码：805 / 810

页数：6

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