Near-field excitation and near-field detection of propagating surface plasmon polaritons on Au waveguide structures

被引:32
|
作者
Dallapiccola, R. [1 ]
Dubois, C. [1 ]
Gopinath, A. [2 ]
Stellacci, F. [1 ]
Dal Negro, L. [2 ,3 ]
机构
[1] MIT, Dept Mat Sci & Engn, Cambridge, MA 02139 USA
[2] Boston Univ, Dept Elect & Comp Engn, Boston, MA 02215 USA
[3] Boston Univ, Div Mat Sci & Engn, Brookline, MA 02446 USA
关键词
electron beam lithography; gold; metallic thin films; optical waveguides; polaritons; surface plasmons;
D O I
10.1063/1.3152291
中图分类号
O59 [应用物理学];
学科分类号
摘要
The propagation of surface plasmon polaritons guided along Au metal waveguides fabricated by electron-beam lithography is experimentally investigated using simultaneous near-field excitation and detection of plasmon-polariton modes localized at the air/Au interface. The directly measured propagation characteristics of surface plasmon-polaritons agree well with simulation results obtained using full-vector calculations and the analytic dispersion of asymmetric plasmonic waveguides for thin Au films. Our results demonstrate that near-field excitation/detection schemes are well suited for direct imaging and characterization of propagating surface plasmon-fields bound to thin-film metal layers, and can be used for fast and reliable characterization of plasmonic waveguide elements and nanodevices.
引用
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页数:3
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