Investigation of the structure of thin HfO2 films by soft x-ray reflectometry techniques

被引：22

作者：

Filatova, E. O. ^{[1
]}

Sokolov, A. A. ^{[1
]}

Kozhevnikov, I. V. ^{[2
]}

Taracheva, E. Yu ^{[1
]}

Grunsky, O. S. ^{[3
]}

Schaefers, F. ^{[4
]}

Braun, W. ^{[4
]}

机构：

[1] St Petersburg State Univ, Inst Phys, St Petersburg 198504, Russia

[2] Russian Acad Sci, Inst Crystallog, Moscow 119333, Russia

[3] St Petersburg State Univ, Geol Fac, St Petersburg 198504, Russia

[4] BESSY, D-12489 Berlin, Germany

来源：

JOURNAL OF PHYSICS-CONDENSED MATTER | 2009年 / 21卷 / 18期

关键词：

D O I：

10.1088/0953-8984/21/18/185012

中图分类号：

O469 [凝聚态物理学];

学科分类号：

070205 ;

摘要：

HfO2 thin films of different thicknesses and deposited by two methods (ALD and MOCVD) were studied. The microstructure of films was characterized by reflection spectroscopy, x-ray diffraction (XRD), and soft x-ray reflectometry. It was established that the HfO2 film microstructure is closely dependent on film thickness. The 5 nm thick film synthesized by ALD shows an amorphous phase while the film prepared by MOCVD was inhomogeneous in depth and showed signs of crystalline structure. First results on the reconstruction of the depth distribution of chemical elements based on the analysis of reflectivity curves are discussed.

引用

页数：7

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