Hierarchical Pore Development by Plasma Etching of Zr-Based Metal-Organic Frameworks

被引：37

作者：

DeCoste, Jared B. ^{[2
]}

Rossin, Joseph A. ^{[3
]}

Peterson, Gregory W. ^{[1
]}

机构：

[1] US Army, Edgewood Chem Biol Ctr, Aberdeen Proving Ground, MD 20101 USA

[2] Leidos Inc, Gunpowder, MD 21010 USA

[3] Guild Associates Inc, Dublin, OH 43228 USA

来源：

CHEMISTRY-A EUROPEAN JOURNAL | 2015年 / 21卷 / 50期

关键词：

hierarchical porosity; mesoporous materials; metal-organic frameworks; plasma etching; UiO-66; POSTSYNTHETIC LIGAND; ZIRCONIUM; ADSORPTION; FUNCTIONALIZATION; STABILITY; EXCHANGE; FLUORIDE; HKUST-1; ROUTE;

D O I：

10.1002/chem.201503632

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

The typically stable Zr-based metal-organic frameworks (MOFs) UiO-66 and UiO-66-NH2 were treated with tetrafluoromethane (CF4) and hexafluoroethane (C2F6) plasmas. Through interactions between fluoride radicals from the perfluoroalkane plasma and the zirconium-oxygen bonds of the MOF, the resulting materials showed the development of mesoporosity, creating a hierarchical pore structure. It is anticipated that this strategy can be used as a post-synthetic technique for developing hierarchical networks in a variety of MOFs.

引用

页码：18029 / 18032

页数：4

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