Thermal stability of 5083 Al synthesized by reactive atomization and deposition

被引：8

作者：

Lin, YJ ^{[1
]}

Zhou, YZ

Hayes, RW

Lavernia, EJ

机构：

[1] Univ Calif Davis, Dept Chem Engn & Mat Sci, Davis, CA 95616 USA

[2] Met Technol Inc, Northridge, CA 91324 USA

来源：

SCRIPTA MATERIALIA | 2004年 / 51卷 / 01期

关键词：

reactive atomization and deposition; thermal stability; oxide dispersoid;

D O I：

10.1016/j.scriptamat.2004.03.009

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Vickers microhardness and tensile properties are measured for the extruded and annealed 5083 Al synthesized by reactive atomization and deposition (RAD) and by N-2 spray deposition (SDN). The results show a higher thermal stability for RAD 5083 Al compared to SDN 5083 At, which is primarily attributed to the grain boundary pinning originating from fine MgO dispersoids. (C) 2004 Acta Materialia Inc. Published by Elsevier Ltd. All rights reserved.

引用

页码：71 / 76

页数：6

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