Scanning tunneling microscopy evidence of a special bonding of Cu adatoms on Si(111)-√3 x √3-Ag surface -: Direct observation of surface-state electron migration

被引:3
作者
Tong, X [1 ]
Shiokawa, T [1 ]
Hammure, K [1 ]
Aoyagi, Y [1 ]
机构
[1] RIKEN, Inst Phys & Chem Res, Wako, Saitama 3510198, Japan
关键词
adatoms; migration; silicon; surface electronic phenomena; scanning tunneling microscopy;
D O I
10.1016/S0039-6028(99)01161-9
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
STM observations provide direct evidence that the S-1 surface states around the Cu adatoms on the root 3 x root 3-Ag substrate are donated by excess electrons from Cu adatoms, resulting in metallic surface bonds of Cu adatoms on the root 3 x root 3-Ag surface. These donated electrons can easily migrate along the SI surface states together with the Cu adatoms: this can be explained by the delocalized character of the S-1 surface state and the Coulomb attraction between the donated electrons and the adatoms. (C) 2000 Elsevier Science B.V. All lights reserved.
引用
收藏
页码:L120 / L126
页数:7
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