Microelectrode patterning of metal films using pulsed UV-laser system

被引：4

作者：

Yang, Chih-Chung ^{[1
]}

Hsiao, Wen-Tse ^{[1
]}

Chung, Chien-Kai ^{[1
]}

Tsai, Hsin-Yi ^{[1
]}

Yeh, Jer-Liang Andrew ^{[1
,2
,3
]}

Huang, Kuo-Cheng ^{[1
]}

机构：

[1] Natl Appl Res Labs, Instrument Technol Res Ctr, Hsinchu 30076, Taiwan

[2] Natl Tsing Hua Univ, Inst Nanoengn & Microsyst, Hsinchu 30013, Taiwan

[3] Natl Tsing Hua Univ, Dept Power Mech Engn, Hsinchu 30013, Taiwan

来源：

APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING | 2014年 / 117卷 / 01期

关键词：

Graphene Oxide; Scanning Speed; Metal Film; Laser Fluence; Electrical Isolation;

D O I：

10.1007/s00339-014-8315-5

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

This study presents a maskless method to conduct microelectrode patterning of metal films using pulsed UV-laser-writing technology. The experimental procedures involved designing the ablation region of a glass substrate, ablation path planning, and determining detailed laser-writing parameters. The various parameters used in a UV-laser-writing system were investigated and analyzed using an optical microscope and a three-dimensional confocal laser scanning microscope. This technique was successfully applied in patterning aluminum (Al) thin film on a glass substrate for use in microheater devices. The measurements of electrical resistance and temperature distribution on the substrate demonstrated that no short circuiting occurred in the microheater, confirming the quality of the electrical isolation values.

引用

页码：161 / 168

页数：8