RF Magnetron Sputtering Deposition of TiO2 Thin Films in a Small Continuous Oxygen Flow Rate

被引：50

作者：

Simionescu, Octavian-Gabriel ^{[1
,2
]}

Romanitan, Cosmin ^{[1
,2
]}

Tutunaru, Oana ^{[1
]}

Ion, Valentin ^{[3
]}

Buiu, Octavian ^{[1
]}

Avram, Andrei ^{[1
]}

机构：

[1] Natl Inst Res & Dev Microtechnol, 126A Erou Iancu Nicolae St, Bucharest 077190, Romania

[2] Univ Bucharest, Fac Phys, 405 Atomistilor St, Bucharest 077125, Romania

[3] Natl Inst Laser Plasma & Radiat Phys, 409 Atomistilor St, Bucharest 077125, Romania

来源：

COATINGS | 2019年 / 9卷 / 07期

关键词：

room temperature; magnetron sputtering; rutile TiO2; SUBSTRATE BIAS VOLTAGE; CORROSION-RESISTANCE; OPTICAL-PROPERTIES; STAINLESS-STEEL; PHOTOCATALYTIC ACTIVITY; TEMPERATURE; COATINGS; LAYER; POLYCRYSTALLINE; PROTECTION;

D O I：

10.3390/coatings9070442

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Rutile titanium oxide (TiO2) thin films require more energy to crystallize than the anatase phase of TiO2. It is a prime candidate for micro-optoelectronics and is usually obtained either by high substrate temperature, applying a substrate bias, pulsed gas flow to modify the pressure, or ex situ annealing. In the present work, we managed to obtain high enough energy at the substrate in order for the particles to form rutile TiO2 at room temperature without any intentional substrate bias in a continuous gas flow. The rutile TiO2 thin films were deposited by a reactive radiofrequency magnetron sputtering system from a titanium target, in an argon/oxygen gas mixture. Investigations regarding the film's structure and morphology were performed by X-ray diffraction (XRD), X-ray reflectivity (XRR), scanning electron microscopy (SEM) and energy-dispersive X-ray spectroscopy (EDAX), while the optical properties were investigated by means of ellipsometry.

引用

页数：13