Measurement of oxide film growth on Mg and Al surfaces over extended periods using XPS

被引：130

作者：

Chen, C ^{[1
]}

Splinter, SJ ^{[1
]}

Do, T ^{[1
]}

McIntyre, NS ^{[1
]}

机构：

[1] UNIV WESTERN ONTARIO,LONDON,ON N6C 5B7,CANADA

来源：

SURFACE SCIENCE | 1997年 / 382卷 / 1-3期

关键词：

aluminum; magnesium; oxidation; polycrystalline surfaces; x-ray photoelectron spectroscopy; water;

D O I：

10.1016/S0039-6028(97)00054-X

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

X-ray photoelectron spectroscopy (XPS) has been used to follow oxide film growth on pure magnesium and pure aluminum surfaces across 12 orders of magnitude exposure to water vapour and humid air. Both Mg and Al exhibited logarithmic-type oxide growth kinetics. Oxide film growth was observed to continue well into the ambient exposure range, suggesting the possibility For modifying the oxide film chemistry while still under atmospheric conditions. The chemistry of the films was monitored as a function of exposure by examining the changes in the core-level O Is spectra and the associated oxidised metal/oxygen stoichiometry. It was observed that both MS and Al surfaces initially formed partially hydrated oxide surfaces which became progressively more hydrated at longer exposures. (C) 1997 Elsevier Science B.V.

引用

页码：L652 / L657

页数：6

共 20 条

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