Synthesis and deposition of metal nanoparticles by gas condensation process

被引：16
|
作者：
Maicu, Marina [1 ]
Schmittgens, Ralph [2 ]
Hecker, Dominic [1 ,2 ]
Gloess, Daniel [1 ]
Frach, Peter [1 ]
Gerlach, Gerald [2 ]
机构：
[1] Fraunhofer Inst Elektronenstrahl & Plasmatech, FEP, D-01277 Dresden, Germany
[2] Tech Univ Dresden, Inst Festkorperelekt, IFE, D-01069 Dresden, Germany
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A | 2014年 / 32卷 / 02期
关键词：
MAGNETRON PLASMA; THIN-FILMS; CLUSTER; NANOCOMPOSITES; NANOCLUSTERS; DIOXIDE; AU;
D O I：
10.1116/1.4859260
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
In this work, the synthesis of Pt and Ag nanoparticles by means of the inert gas phase condensation of sputtered atomic vapor is presented. The process parameters (power, sputtering time, and gas flow) were varied in order to study the relationship between deposition conditions and properties of the nanoparticles such as their quantity, size, and size distribution. Moreover, the gas phase condensation process can be combined with a plasma enhanced chemical vapor deposition procedure in order to deposit nanocomposite coatings consisting of metallic nanoparticles embedded in a thin film matrix material. Selected examples of application of the generated nanoparticles and nanocomposites are discussed. (C) 2014 American Vacuum Society.
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页数：9
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