Large scale high precision nano-oxidation using an atomic force microscope

被引:20
作者
Kuramochi, H
Ando, K
Tokizaki, T
Yasutake, A
Pérez-Murano, F
Dagata, JA
Yokoyama, H
机构
[1] NRI AIST, Tsukuba Cent 4, Tsukuba, Ibaraki 3058568, Japan
[2] Seiko Instruments Inc, Shizuoka 4101393, Japan
[3] AIST, Nanotechnol Res Inst, Tsukuba, Ibaraki 3058568, Japan
[4] NIST, Gaithersburg, MD 20899 USA
关键词
oxidation; atomic force microscopy; silicon;
D O I
10.1016/j.susc.2004.05.066
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Scanning probe microscope nano-oxidation is carried out on H-passivated Si(0 0 1) surfaces using a humidity control atomic force microscope (AFM) in contact and dynamic modes. To achieve high precision nano-oxidation at large scale, the original tube-scanner-based AFM unit is modified: horizontal movement of the whole sample block (sample stage and the scanner) is operated by an additional AT piezo stage, whilst its vertical movement is controlled by a piezo tube-scanner. The high linearity of the horizontal movement is demonstrated by high resolution oxide patterns which are fabricated after the instrumental modification using standard AFM cantilevers and a modified AFM cantilever with an added carbon nano-tube on tip. (C) 2004 Elsevier B.V. All rights reserved.
引用
收藏
页码:343 / 348
页数:6
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