Molecular dynamics simulation of nano-lithography process using atomic force microscopy

A three-dimensional molecular dynamics (MD) model is utilized to study the effects of the scribing feed on the atomic-scale lithography process. The model utilizes the Morse potential function to simulate interatomic forces between the atoms of the workpiece and the tool, and also between the atoms of the workpiece themselves. MD simulation results are compared to atomic force microscopy (AFM) experimental results. Results show that both resultant force and surface roughness have a positive correlation with rate of feed when the feed is smaller than a critical value, after which they remain constant. Comparison of the feed effect behavior of the MD theoretical analysis and the AFM experiments shows good qualitative agreement. (C) 2002 Elsevier Science B.V. All rights reserved.