A 13 kV 4H-SiC n-channel IGBT with Low Rdiff,on and Fast Switching

被引:42
作者
Das, Mrinal K. [1 ]
Zhang, Qingchun [1 ]
Callanan, Robert [1 ]
Capell, Craig [1 ]
Clayton, Jack [1 ]
Donofrio, Matthew [1 ]
Haney, Sarah [1 ]
Husna, Fatima [1 ]
Jonas, Charlotte [1 ]
Richmond, James [1 ]
Sumakeris, Joseph J. [1 ]
机构
[1] Cree Inc, Res Triangle Pk, NC 27709 USA
来源
SILICON CARBIDE AND RELATED MATERIALS 2007, PTS 1 AND 2 | 2009年 / 600-603卷
关键词
IGBT; MOSFET; High Voltage; High Temperature;
D O I
10.4028/www.scientific.net/MSF.600-603.1183
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
For the first time, high power 4H-SiC n-IGBTs have been demonstrated with 13 kV blocking and a low R(diff,on) of 22 m Omega cm(2) which surpasses the 4H-SiC material limit for unipolar devices. Normally-off operation and >10 kV blocking is maintained up to 200 degrees C base plate temperature. The on-state resistance has a slight positive temperature coefficient which makes the n-IGBT attractive for parallel configurations. MOS characterization reveals a low net positive fixed charge density in the oxide and a low interface trap density near the conduction band which produces a 3 V threshold and a peak channel mobility of 18 cm(2)/VS in the lateral MOSFET test structure. Finally, encouraging device yields of 64% in the on-state and 27% in the blocking indicate that the 4H-SiC n-IGBT may eventually become a viable power device technology.
引用
收藏
页码:1183 / 1186
页数:4
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