Development of glancing-incidence and glancing-take-off X-ray fluorescence apparatus for surface and thin-film analyses

被引:15
|
作者
Tsuji, K
Wagatsuma, K
Hirokawa, K
Yamada, T
Utaka, T
机构
[1] ULVAC JAPAN LTD,PHI INC,CHIGASAKI,KANAGAWA 253,JAPAN
[2] RIGAKU DENKI CORP,TAKATSUKI,OSAKA 569,JAPAN
关键词
total reflection; X-ray fluorescence; surface analysis; surface density;
D O I
10.1016/S0584-8547(96)01667-9
中图分类号
O433 [光谱学];
学科分类号
0703 ; 070302 ;
摘要
We have studied X-ray fluorescence analysis under glancing incidence and glancing take-off conditions. Recently, we have developed a third apparatus for detecting glancing-incidence and take-off X-ray fluorescence, which makes it possible to measure the incident-angle dependence, the take-off-angle dependence, X-ray reflectivity, and X-ray diffraction. Primarily, we have measured the take-off angular dependence of X-ray fluorescence using this apparatus. Glancing take-off X-ray fluorescence has some advantages in comparison with glancing-incidence X-ray fluorescence. The surface density and the absolute angles were determined by analysing the take-off angle dependence of the fluorescent X-rays emitted from identical atoms with the aid of the reciprocity theorem. (C) 1997 Elsevier Science B.V.
引用
收藏
页码:841 / 846
页数:6
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