MOCVD growth and AFM observation of non c-axis oriented Bi-2223 surperconducting thin films

被引:4
作者
Endo, K
Ishikawa, H
Badica, P
Matsuhata, H
Yoshizawa, T
Abe, K
Itoh, J
Kajimura, K
机构
[1] Natl Inst Adv Ind Sci & Technol, Tsukuba, Ibaraki 3058568, Japan
[2] Tokyo Denki Univ, Chiyoda Ku, Tokyo 1018457, Japan
来源
PHYSICA C-SUPERCONDUCTIVITY AND ITS APPLICATIONS | 2002年 / 372卷
关键词
MOCVD; AFM; BSCCO superconductor; non c-axis; oriented Bi-2223; (119)Bi-2223;
D O I
10.1016/S0921-4534(02)00845-6
中图分类号
O59 [应用物理学];
学科分类号
摘要
The preparation of non c-axis oriented high T, superconductor films with longer coherence length is one of the key technologies toward realization of viable Josephson devices. For the first time. we have succeeded in growing in-plane aligned (119)Bi-2223 films on (110)SMO3 substrates by metalorganic chemical vapor deposition using a two-step growth temperature procedure. This procedure was found to be effective for orientation control and phase control in comparison with a fixed growth temperature procedure. As a result, superconducting properties were improved. The surface morphology observed by atomic force microscopy showed an in-plane aligned mountain-range shape, which strongly reflects the orientation relationship between the (119)Bi-2212 film and (110)SMO3 substrate. (C) 2002 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:1071 / 1074
页数:4
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