AFM imaging and fractal analysis of surface roughness of AIN epilayers on sapphire substrates

被引：87

作者：

Dallaeva, Dinara ^{[1
]}

Talu, Stefan ^{[2
]}

Stach, Sebastian ^{[3
]}

Skarvada, Pavel ^{[1
]}

Tomanek, Pavel ^{[1
]}

Grmela, Lubomir ^{[1
]}

机构：

[1] Brno Univ Technol, Fac Elect Engn & Commun, Dept Phys, Brno 61600, Czech Republic

[2] Tech Univ Cluj Napoca, Fac Mech Engn, Dept AET, Discipline Descript Geometry & Engn Graph, Cluj Napoca 400641, Cluj, Romania

[3] Silesian Univ, Fac Comp Sci & Mat Sci, Dept Biomed Comp Syst, PL-41205 Sosnowiec, Poland

来源：

APPLIED SURFACE SCIENCE | 2014年 / 312卷

关键词：

Aluminum nitride; Epitaxy; Substrate; Surface roughness; Atomic force microscopy; Fractal analysis; THIN-FILM; MULTIFRACTAL ANALYSIS; MORPHOLOGY;

D O I：

10.1016/j.apsusc.2014.05.086

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

The paper deals with AFM imaging and characterization of 3D surface morphology of aluminum nitride (AIN) epilayers on sapphire substrates prepared by magnetron sputtering. Due to the effect of temperature changes on epilayer's surface during the fabrication, a surface morphology is studied by combination of atomic force microscopy (AFM) and fractal analysis methods. Both methods are useful tools that may assist manufacturers in developing and fabricating AIN thin films with optimal surface characteristics. Furthermore, they provide different yet complementary information to that offered by traditional surface statistical parameters. This combination is used for the first time for measurement on AIN epilayers on sapphire substrates, and provides the overall 3D morphology of the sample surfaces (by AFM imaging), and reveals fractal characteristics in the surface morphology (fractal analysis). (C) 2014 Elsevier B.V. All rights reserved.

引用

页码：81 / 86

页数：6

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