Oxygen depth profiling by resonant RBS in NiTi after plasma immersion ion implantation

被引：9
作者：
Maendl, S.
Lindner, J. K. N.
机构：
[1] Leibniz Inst Oberflachenmodifizieurung, D-04303 Leipzig, Germany
[2] Univ Augsburg, Inst Phys, D-86135 Augsburg, Germany
来源：
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 2006年 / 249卷
关键词：
RBS; PIII; NiTi; diffusion; rutile;
D O I：
10.1016/j.nimb.2006.04.027
中图分类号：
TH7 [仪器、仪表];
学科分类号：
0804 ; 080401 ; 081102 ;
摘要：
NiTi exhibits super-elastic as well as shape-memory properties, which results in a large potential application field in biomedical technology. Using oxygen ion implantation at elevated temperatures, it is possible to improve the biocompatibility. Resonant Rutherford backscattering spectroscopy (RRBS) is used to investigate the oxygen depth profile obtained after oxygen plasma immersion ion implantation (PIII) at 25 kV and 400-600 degrees C. At all temperatures, a layered structure consisting of TiO2/Ni3Ti/NiTi was found with sharp interfaces while no discernible content of oxygen inside Ni3Ti or nickel in TiO2 was found. These data are compatible with a titanium diffusion from the bulk towards the implanted oxygen. (c) 2006 Elsevier B.V. All rights reserved.
引用
收藏
页码：355 / 357
页数：3
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