Absolute photoyield from chemical vapor-deposited diamond and diamond-like carbon films in the UV

被引：28

作者：

Breskin, A

Chechik, R

Shefer, E

Bacon, D

Avigal, Y

Kalish, R

Lifshitz, Y

机构：

[1] TECHNION ISRAEL INST TECHNOL, IL-32000 HAIFA, ISRAEL

[2] SOREQ NRC, IL-81800 YAVNE, ISRAEL

来源：

APPLIED PHYSICS LETTERS | 1997年 / 70卷 / 25期

关键词：

D O I：

10.1063/1.119197

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The absolute photoyields of chemical vapor deposited (CVD) diamond and amorphous hydrogen-free diamondlike carbon (DLC) films, in the range of 140-300 nm, are reported. CVD diamond films exhibit a large photoyield, of a few percent in the range 140-180 nm. DLC films have a 20-50 times lower yield. Post growth hydrogenation is found to substantially increase the photoyield of CVD diamond films. We discuss the applicability of these films as UV photocathodes coupled to electron multipliers based on gaseous charge multiplication. (C) 1997 American Institute of Physics.

引用

页码：3446 / 3448

页数：3

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