Formation of GaSb/GaAs quantum dots in MOCVD growth

被引:4
作者
Müller-Kirsch, L
Heitz, R
Pohl, UW
Bimberg, D
Häuster, I
Kirmse, H
Neumann, W
机构
[1] Tech Univ Berlin, Inst Festkorperphys, D-10623 Berlin, Germany
[2] Humboldt Univ, AG Kristallog, Inst Phys, D-10115 Berlin, Germany
关键词
MOCVD; GaSb; quantum dots;
D O I
10.1016/S1386-9477(02)00331-4
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The formation of GaSb quantum dots on a GaAs (0 0 1) substrate under metalorganic chemical vapor deposition conditions is investigated. Transmission electron microscopy images and photoluminescence measurements show the island density to be determined in an initial kinetically controlled phase. Subsequently, mass transfer from the two-dimensional wetting layer sustains the growth of the GaSb quantum dots (QDs). Many-particle effects in the type II QDs are investigated by excitation- and temperature-dependent photoluminescence measurements. The peculiar optical behavior is dominated by Coulomb charging and state filling of the localized holes. (C) 2002 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:1181 / 1184
页数:4
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