Microstructure and mechanical properties of boron carbide thin films

被引：67

作者：

Han, ZH ^{[1
]}

Li, GY ^{[1
]}

Tian, JW ^{[1
]}

Gu, MY ^{[1
]}

机构：

[1] Shanghai Jiao Tong Univ, State Key Lab MMCs, Shanghai 200030, Peoples R China

来源：

MATERIALS LETTERS | 2002年 / 57卷 / 04期

关键词：

boron carbide thin films; microstructure; mechanical properties; magnetron sputtering;

D O I：

10.1016/S0167-577X(02)00892-3

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Boron carbide thin films were deposited on single-crystal silicon substrates with magnetron sputtering method at different temperatures using a sintered B4C target. Auger electron spectroscopy, Fourier transform infrared spectroscopy and transmission electronic microscopy were employed to characterize their chemical compositions and microstructure. Mechanical properties of the films were evaluated using a nanoindenter. The results show the as-deposited boron carbide films are amorphous or microcrystalline with high hardness and high modulus. With the increase of the substrate temperature, boron carbide films show a tendency of crystallization, and accordingly the hardness and modulus reach 50.4 and 420 GPa from 42.5 and 300 GPa, respectively. (C) 2002 Elsevier Science B.V. All rights reserved.

引用

页码：899 / 903

页数：5

共 10 条

[1] Influences of pileup on the measurement of mechanical properties by load and depth sensing indentation techniques [J].

Bolshakov, A ;

Pharr, GM .

JOURNAL OF MATERIALS RESEARCH, 1998, 13 (04) :1049-1058

[2] Synthesis of boron carbide films by ion beam sputtering [J].

Chen, HY ;

Wang, J ;

Yang, H ;

Li, WZ ;

Li, HD .

SURFACE & COATINGS TECHNOLOGY, 2000, 128 :329-333

[3] PROPERTIES OF RF-SPUTTERED B4C THIN-FILMS [J].

CHIANG, CI ;

HOLLECK, H ;

MEYER, O .

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1994, 91 (1-4) :692-695

[4] Influence of carbon content on the crystallographic structure of boron carbide films [J].

Conde, O ;

Silvestre, AJ ;

Oliveira, JC .

SURFACE & COATINGS TECHNOLOGY, 2000, 125 (1-3) :141-146

[5] Structures and properties of disordered boron carbide coatings generated by magnetron sputtering [J].

Hu, T ;

Steihl, L ;

Rafaniello, W ;

Fawcett, T ;

Hawn, DD ;

Mashall, JG ;

Rozeveld, SJ ;

Putzig, CL ;

Blackson, JH ;

Cermignani, W ;

Robinson, MG .

THIN SOLID FILMS, 1998, 332 (1-2) :80-86

[6] AN IMPROVED TECHNIQUE FOR DETERMINING HARDNESS AND ELASTIC-MODULUS USING LOAD AND DISPLACEMENT SENSING INDENTATION EXPERIMENTS [J].

OLIVER, WC ;

PHARR, GM .

JOURNAL OF MATERIALS RESEARCH, 1992, 7 (06) :1564-1583

[7] Deposition of boron carbide thin film by supersonic plasma jet CVD with secondary discharge [J].

Postel, O ;

Heberlein, J .

SURFACE & COATINGS TECHNOLOGY, 1998, 108 (1-3) :247-252

[8] Magnetron-sputtered superhard materials [J].

Ulrich, S ;

Theel, T ;

Schwan, J ;

Ehrhardt, H .

SURFACE & COATINGS TECHNOLOGY, 1997, 97 (1-3) :45-59

[9]

Ulrich S., 1998, DIAM RELAT MATER, V7, P838

[10]

Veprek S, 1999, J VAC SCI TECHNOL A, V17, P2401, DOI 10.1116/1.581977

← 1 →