On Device Architectures, Subthreshold Swing, and Power Consumption of the Piezoelectric Field-Effect Transistor (μ-FET)

被引:15
作者
Hueting, Raymond J. E. [1 ]
Van Hemert, Tom [1 ]
Kaleli, Buket [1 ]
Wolters, Rob A. M. [1 ,2 ]
Schmitz, Jurriaan [1 ]
机构
[1] Univ Twente, MESA Inst Nanotechnol, NL-7500 AE Enschede, Netherlands
[2] NXP Semicond, NL-5656 AA Eindhoven, Netherlands
来源
IEEE JOURNAL OF THE ELECTRON DEVICES SOCIETY | 2015年 / 3卷 / 03期
关键词
Piezoelectric effect; MOSFET; CMOS; subthermal device; steep-subthreshold device; THIN-FILMS; TRANSPORT PROBLEMS; CARRIER TRANSPORT; BAND-STRUCTURE; STRAIN; MODEL; LAYER; MOBILITY; SILICON; SI;
D O I
10.1109/JEDS.2015.2409303
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This paper describes the potential of tunable strain in field-effect transistors to boost performance of digital logic. Voltage-controlled strain can be imposed on a semiconductor body by the integration of a piezoelectric material improving transistor performance. In this paper, we derive the relations governing the subthreshold swing in such devices to improve the understanding. Using these relations and considering the mechanical and technological boundary conditions, we discuss possible device architectures that employ this principle. Further, we review the recently published experimental and modeling results of this device, and give analytical estimates of the power consumption.
引用
收藏
页码:149 / 157
页数:9
相关论文
共 54 条
  • [31] Compact Models and the Physics of Nanoscale FETs
    Lundstrom, Mark S.
    Antoniadis, Dimitri A.
    [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 2014, 61 (02) : 225 - 233
  • [32] ALTERNATIVE APPROACH TO SOLUTION OF ADDED CARRIER TRANSPORT PROBLEMS IN SEMICONDUCTORS
    MCKELVEY, JP
    BRODY, TP
    LONGINI, RL
    [J]. PHYSICAL REVIEW, 1961, 123 (01): : 51 - &
  • [33] FLUX METHODS FOR ANALYSIS OF TRANSPORT PROBLEMS IN SEMICONDUCTORS IN PRESENCE OF ELECTRIC FIELDS
    MCKELVEY, JP
    BALOGH, JC
    [J]. PHYSICAL REVIEW, 1965, 137 (5A): : 1555 - &
  • [34] Self-limiting low-temperature growth of crystalline AlN thin films by plasma-enhanced atomic layer deposition
    Ozgit, Cagla
    Donmez, Inci
    Alevli, Mustafa
    Biyikli, Necmi
    [J]. THIN SOLID FILMS, 2012, 520 (07) : 2750 - 2755
  • [35] AMBIPOLAR CARRIER TRANSPORT AND SURFACE RECOMBINATION VELOCITY IN SEMICONDUCTOR SURFACE LAYERS
    PULVER, EF
    MCKELVEY, JP
    [J]. PHYSICAL REVIEW, 1967, 158 (03): : 779 - &
  • [36] Strained SiNMOSFETs for high performance CMOS technology
    Rim, K
    Koester, S
    Hargrove, M
    Chu, J
    Mooney, PM
    Ott, J
    Kanarsky, T
    Ronsheim, P
    Ieong, M
    Grill, A
    Wong, HSP
    [J]. 2001 SYMPOSIUM ON VLSI TECHNOLOGY, DIGEST OF TECHNICAL PAPERS, 2001, : 59 - 60
  • [37] Rusu A., 2010, Electron Devices Meeting (IEDM), p16.3.1, DOI DOI 10.1109/IEDM.2010.5703374
  • [38] Salahuddin S., 2008, PROC IEEE INT ELECT, P1
  • [39] On the influence of the top and bottom electrodes - A comparative study between Pt and LNO electrodes for PZT thin films
    Sama, Nossikpendou
    Herdier, Romain
    Jenkins, David
    Soyer, Caroline
    Remiens, Denis
    Detalle, Mickael
    Bouregba, Rachid
    [J]. JOURNAL OF CRYSTAL GROWTH, 2008, 310 (14) : 3299 - 3302
  • [40] Schroder D. K., 2005, Semiconductor material and device characterization