Improved radiometry for extreme-ultraviolet lithography

被引:0
作者
Tarrio, C [1 ]
Vest, RE [1 ]
Grantham, S [1 ]
Liu, K [1 ]
Lucatorto, TB [1 ]
Shaw, PS [1 ]
机构
[1] Natl Inst Stand & Technol, Phys Lab, Gaithersburg, MD 20899 USA
来源
SYNCHROTRON RADIATION INSTRUMENTATION | 2004年 / 705卷
关键词
D O I
暂无
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
The absolute cryogenic radiometer (ACR), an electrical-substitution-based detector, is the most accurate method for measurement of radiant power in the extreme ultraviolet. At the National Institute of Standards and Technology, ACR-based measurements are currently used as standards from the infrared and into the vacuum ultraviolet, however, no radiometric facilities are currently in operation with enough incident power to use an ACR in the extreme-ultraviolet region. Therefore, we have installed transfer optics on an existing beamline to allow the installation of the ACR as an additional endstation. We will describe the current radiometric beamline, the ACR, and the high-throughput beamline, and the transfer-optical system. Finally, we will present the performance of the transfer optics and measurements of the beam profile and incident power of the new endstation.
引用
收藏
页码:608 / 611
页数:4
相关论文
共 50 条
[41]   Shearing interferometry for at wavelength wavefront measurement of extreme-ultraviolet lithography projection optics [J].
Zhu, YC ;
Sugisaki, K ;
Murakami, K ;
Ota, K ;
Kondo, H ;
Ishii, M ;
Kawakami, J ;
Oshino, T ;
Saito, J ;
Suzuki, A ;
Hasegawa, M ;
Sekine, Y ;
Takeuchi, S ;
Ouchi, C ;
Kakuchi, O ;
Watanabe, Y ;
Hasegawa, T ;
Hara, S .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 2003, 42 (9A) :5844-5847
[42]   Defect Characterization of an Extreme-Ultraviolet Mask Using a Coherent Extreme-Ultraviolet Scatterometry Microscope [J].
Harada, Tetsuo ;
Nakasuji, Masato ;
Tokimasa, Akifumi ;
Watanabe, Takeo ;
Usui, Youichi ;
Kinoshita, Hiroo .
JAPANESE JOURNAL OF APPLIED PHYSICS, 2012, 51 (06)
[43]   Phase Imaging of Extreme-Ultraviolet Mask Using Coherent Extreme-Ultraviolet Scatterometry Microscope [J].
Harada, Tetsuo ;
Nakasuji, Masato ;
Nagata, Yutaka ;
Watanabe, Takeo ;
Kinoshita, Hiroo .
JAPANESE JOURNAL OF APPLIED PHYSICS, 2013, 52 (06)
[44]   Extreme-ultraviolet refractive optics [J].
Drescher, L. ;
Kornilov, O. ;
Witting, T. ;
Reitsma, G. ;
Monserud, N. ;
Rouzee, A. ;
Mikosch, J. ;
Vrakking, M. J. J. ;
Schuette, B. .
NATURE, 2018, 564 (7734) :91-+
[45]   Tailoring extreme-ultraviolet light [J].
Taro Sekikawa ;
Kenichi L. Ishikawa .
Nature Photonics, 2017, 11 :209-210
[46]   Absolute extreme-ultraviolet metrology [J].
Tarrio, C ;
Vest, RE ;
Grantham, S .
HARNESSING LIGHT: OPTICAL SCIENCE AND METROLOGY AT NIST, 2001, 4450 :94-107
[47]   EXTREME-ULTRAVIOLET OBSERVATIONS OF A SURGE [J].
KIRSHNER, RP ;
NOYES, RW .
SOLAR PHYSICS, 1971, 20 (02) :428-&
[48]   Extreme-ultraviolet refractive optics [J].
L. Drescher ;
O. Kornilov ;
T. Witting ;
G. Reitsma ;
N. Monserud ;
A. Rouzée ;
J. Mikosch ;
M. J. J. Vrakking ;
B. Schütte .
Nature, 2018, 564 :91-94
[49]   EXTREME-ULTRAVIOLET IMAGES OF THE COSMOS [J].
BOWYER, S ;
MALINA, R .
PHYSICS WORLD, 1994, 7 (01) :35-38
[50]   Simulation model of mask with defect and its application to defect compensation in extreme-ultraviolet lithography [J].
Liu, Xiaolei ;
Wang, Xiangzhao ;
Li, Sikun .
Guangxue Xuebao/Acta Optica Sinica, 2015, 35 (08)