Passivation of trap states in polycrystalline Si by cyanide treatments

被引:24
作者
Kanazaki, E
Yoneda, K
Todokoro, Y
Nishitani, M
Kobayashi, H
机构
[1] Osaka Univ, Inst Sci & Ind Res, Ibaraki, Osaka 5670047, Japan
[2] Matsushita Elect Corp, ULSI Proc Technol Dev Ctr, Minami Ku, Kyoto 6018413, Japan
[3] Matsushita Elect Corp, Corp Planning Dept, Semicond Grp, Kyoto 6178520, Japan
[4] Matsushita Elect Ind Co Ltd, Display Device Dev Ctr, Moriguchi, Osaka 5700005, Japan
[5] Osaka Univ, Res Ctr Photoenerget Organ Mat, Osaka, Japan
关键词
semiconductors; electronic states (localized); photoconductivity and photovoltaics; recombination and trapping; photoelectron spectroscopies;
D O I
10.1016/S0038-1098(99)00457-3
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
The cyanide treatment in which polycrystalline Si is immersed in a KCN solution followed by rinsing in boiling water increases the energy conversion efficiency of [ITO/silicon oxide/polycrystalline Si] junction solar cells to 12.5%. The XPS measurements under bias show that the trap density in polycrystalline Si is markedly decreased by the cyanide treatment, especially the decrease near the Fermi level being remarkable. The dark current density for the cells without the cyanide treatment depends only weakly on the temperature, indicating that tunneling is a dominant mechanism for the current how through the Si depletion layer. The cyanide treatment increases the temperature-dependence markedly, showing that thermal excitation of majority carriers becomes necessary for the current flow due to the elimination of the trap states in the Si depletion layer. (C) 1999 Elsevier Science Ltd. All rights reserved.
引用
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页码:195 / 199
页数:5
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