Silicon Photonic Circuit Design Using Rapid Prototyping Foundry Process Design Kits

被引：82

作者：

Chrostowski, Lukas ^{[1
]}

Shoman, Hossam ^{[2
]}

Hammood, Mustafa ^{[2
]}

Yun, Han ^{[2
]}

Jhoja, Jaspreet ^{[2
]}

Luan, Enxiao ^{[2
]}

Lin, Stephen ^{[2
]}

Mistry, Ajay ^{[2
]}

Witt, Donald ^{[2
]}

Jaeger, Nicolas A. E. ^{[2
]}

Shekhar, Sudip ^{[2
]}

Jayatilleka, Hasitha ^{[3
,4
]}

Jean, Philippe ^{[5
]}

B-de Villers, Simon ^{[5
]}

Cauchon, Jonathan ^{[5
]}

Shi, Wei ^{[5
]}

Horvath, Cameron ^{[6
]}

Westwood-Bachman, Jocelyn N. ^{[6
]}

Setzer, Kevin ^{[6
]}

Aktary, Mirwais ^{[6
]}

Patrick, N. Shane ^{[7
]}

Bojko, Richard J. ^{[8
]}

Khavasi, Amin ^{[9
]}

Wang, Xu ^{[10
]}

de Lima, Thomas Ferreira ^{[11
]}

Tait, Alexander N. ^{[11
,12
]}

Prucnal, Paul R. ^{[11
]}

Hagan, David E. ^{[13
]}

Stevanovic, Doris ^{[13
]}

Knights, Andy P. ^{[13
]}

机构：

[1] Univ British Columbia, Stuart Blusson Quantum Matter Inst, Dept Elect & Comp Engn, Vancouver, BC V6T 1Z4, Canada

[2] Univ British Columbia, Dept Elect & Comp Engn, Vancouver, BC V6T 1Z4, Canada

[3] Univ British Columbia, Vancouver, BC V6T 1Z4, Canada

[4] Intel Labs, Santa Clara, CA 95054 USA

[5] Univ Laval, Dept Elect & Comp Engn, Ctr Opt Photon & Lasers, Laval, PQ G1V 0A6, Canada

[6] Appl Nanotools Inc, Edmonton, AB T6G 2M9, Canada

[7] Univ Washington, Washington Nanofabricat Facil, Seattle, WA 98195 USA

[8] GenISys Gmbh, D-82024 Taufkirchen, Germany

[9] Sharif Univ Technol, Dept Elect Engn, Tehran 7941776655, Iran

[10] Lumerical Inc, Vancouver, BC V6E 2M6, Canada

[11] Princeton Univ, Dept Elect Engn, Princeton, NJ 08544 USA

[12] NIST, Boulder, CO 80305 USA

[13] McMaster Univ, Dept Engn Phys, Ctr Emerging Device Technol, Hamilton, ON L8S 4L8, Canada

来源：

IEEE JOURNAL OF SELECTED TOPICS IN QUANTUM ELECTRONICS | 2019年 / 25卷 / 05期

基金：

加拿大自然科学与工程研究理事会;

关键词：

Silicon photonics; foundries; ULTRA-BROAD-BAND; ON-INSULATOR; INTEGRATION; COUPLERS; COMPACT; SENSITIVITY; PERFORMANCE; RESONATORS; FILTERS;

D O I：

10.1109/JSTQE.2019.2917501

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

A successful design, fabrication and test of silicon photonic circuits requires design tools, process design kits (PDKs), foundries for fabrication, and test facilities. This paper describes the complete design flow of photonic circuits using rapid-prototyping multiproject wafer foundry processes available in the SiEPIC program. The focus of this paper is on rapid prototyping based on electron beam lithography as an alternative and complementary to what is available via deep-UV lithography-based foundries. We describe in detail the PDK and the use of open-source and commercial tools for the design of optical filters, sensors, neuromorphic photonic processors, optical switches, and discuss test and packaging approaches for these designs. We demonstrate that a "germanium less" process can be used to build small systems featuring photoconductive detectors, electronics, and phase shifters.

引用

页数：26

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