Computer simulation of ion sputtering of polyatomic multilayered targets

被引:21
作者
Ber, BJ [1 ]
Kharlamov, VS [1 ]
Kudrjavtsev, YA [1 ]
Merkulov, AV [1 ]
Trushin, YV [1 ]
Zhurkin, EE [1 ]
机构
[1] LENINGRAD STATE TECH UNIV,ST PETERSBURG 195251,RUSSIA
关键词
D O I
10.1016/S0168-583X(96)00941-X
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
The novel binary collision approximation Monte Carlo (BCA-MC) computer codes TRIRS and DYTRIRS for simulating ion sputtering of polyatomic nonuniform amorphous targets are presented. TRIRS simulates the collision cascade in a target and related secondary processes, including sputtering, damage generation etc., being more realistic than similar MC-BCA codes in modeling low-energy interatomic collisions. These improvements ensure better simulation of low-energy atomic collision processes in nonuniform targets, like sputtering, and ultra-low energy ion implantation. DYTRIRS is the extension of TRIRS which simulates the dynamics of the ballistic stage of ion-induced modification and sputtering for a target under high-fluence ion irradiation. The efficiency of DYTRIRS is verified by comparing the simulation of sputtering and secondary-inn mass-spectrometry in-depth compositional profiling of molecular-beam epitaxy grown two-dimensional (Al,Ga)As-GaAs (001) heterostructures, including structures with silicon and aluminum marker layers.
引用
收藏
页码:286 / 290
页数:5
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