Low-temperature deposition of meta-stable β-MoO3(011) epitaxial thin films using step-and-terrace substrates

被引：16

作者：

Shimizu, Ryota

Yamamoto, Kuniko

Suzuki, Tohru

Ohsawa, Takeo

Shiraki, Susumu

Hitosugi, Taro

机构：

来源：

THIN SOLID FILMS | 2015年 / 595卷

关键词：

Molybdenum oxides; Magnetron sputtering; Substrate; Epitaxial growth; MOLECULAR-BEAM EPITAXY; MOLYBDENUM TRIOXIDE; GROWTH; MOO3; SURFACE;

D O I：

10.1016/j.tsf.2015.10.066

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

We demonstrated the epitaxial growth of meta-stable beta-MoO3(011) thin films on SrTiO3(100), NdGaO3(110), and NdGaO3(001) substrates, using dc reactive magnetron sputtering. Low-temperature deposition at similar to 200 degrees C resulted in the suppression of the formation of thermodynamically stable alpha-MoO3, and we observed the growth of a beta-MoO3 phase with mixed orientation. In contrast, depositions on substrate surfaces with a step-and-terrace structure resulted in uniaxially oriented beta-MoO3(011) epitaxial thin films. The step-and-terrace structures were found to play an important role in controlling the epitaxial growth behavior of beta-MoO3 thin films. (C) 2015 Elsevier B.V. All rights reserved.

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页码：153 / 156

页数：4

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