Low-temperature deposition of meta-stable β-MoO3(011) epitaxial thin films using step-and-terrace substrates

被引:16
作者
Shimizu, Ryota
Yamamoto, Kuniko
Suzuki, Tohru
Ohsawa, Takeo
Shiraki, Susumu
Hitosugi, Taro
机构
关键词
Molybdenum oxides; Magnetron sputtering; Substrate; Epitaxial growth; MOLECULAR-BEAM EPITAXY; MOLYBDENUM TRIOXIDE; GROWTH; MOO3; SURFACE;
D O I
10.1016/j.tsf.2015.10.066
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We demonstrated the epitaxial growth of meta-stable beta-MoO3(011) thin films on SrTiO3(100), NdGaO3(110), and NdGaO3(001) substrates, using dc reactive magnetron sputtering. Low-temperature deposition at similar to 200 degrees C resulted in the suppression of the formation of thermodynamically stable alpha-MoO3, and we observed the growth of a beta-MoO3 phase with mixed orientation. In contrast, depositions on substrate surfaces with a step-and-terrace structure resulted in uniaxially oriented beta-MoO3(011) epitaxial thin films. The step-and-terrace structures were found to play an important role in controlling the epitaxial growth behavior of beta-MoO3 thin films. (C) 2015 Elsevier B.V. All rights reserved.
引用
收藏
页码:153 / 156
页数:4
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