Hydroxyl Radical Based Photocatalytic Degradation of Halogenated Organic Contaminants and Paraffin on Silica Gel

被引:198
作者
Qu, Ruijuan [1 ]
Li, Chenguang [1 ]
Liu, Jiaoqin [1 ]
Xiao, Ruiyang [2 ]
Pan, Xiaoxue [1 ]
Zeng, Xiaolan [1 ]
Wang, Zunyao [1 ]
Wu, Jichun [3 ]
机构
[1] Nanjing Univ, Sch Environm, State Key Lab Pollut Control & Resource Reuse, Nanjing 210023, Jiangsu, Peoples R China
[2] Cent S Univ, Sch Met & Environm, Inst Environm Engn, Changsha 410083, Hunan, Peoples R China
[3] Nanjing Univ, Sch Earth Sci & Engn, Key Lab Surficial Geochem, Nanjing 210023, Jiangsu, Peoples R China
基金
中国国家自然科学基金;
关键词
DECABROMODIPHENYL ETHER BDE-209; MOLECULAR-OXYGEN; SURFACE; PHOTOCHEMISTRY; GENERATION; PHOTOLYSIS; MECHANISM; PROPENE; PHOTODEGRADATION; PHOTOMETATHESIS;
D O I
10.1021/acs.est.8b00499
中图分类号
X [环境科学、安全科学];
学科分类号
08 ; 0830 ;
摘要
Photochemical materials are of scientific and practical importance in the field of photocatalysis. In this study, the photochemistry of several organic contaminants, including decabromodiphenyl ether (BDE-209), halogenated phenols (C6X5OH, X = F, Cl, Br) and paraffin, on silica gel (SG) surface was investigated under simulated solar irradiation conditions. Photolysis of these compounds at the solid/air interface proceeds with different rates yielding various hydroxylation products, and hydroxyl radical was determined as the major reactive species. According to density functional theory (DFT) calculations, the reaction of physically adsorbed water with reactive silanone sites (>Si=O) on silica was indispensable for the generation of OH radical, where the required energy matches well with the irradiation energy of visible light. Then, the BDE-209 was selected as a representative compound to evaluate the photocatalytic performance of SG under different conditions. The SG material showed good stability in the photodegradation process, and was able to effectively eliminate BDE-209 under natural sunlight. These findings provide new insights into the potential application of SG as a solid surface photocatalyst for contaminants removal.
引用
收藏
页码:7220 / 7229
页数:10
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