Electrochemistry nanometric patterning of MOF particles:: Anisotropic metal electrodeposition in Cu/MOF

被引:41
作者
Domenech, Antonio
Garcia, Hermenegildo
Domenech-Carbo, Maria Teresa
Xamena, F. X. L. I.
机构
[1] Univ Valencia, Dept Quim Analit, E-46100 Valencia, Spain
[2] Univ Politecn Valencia, CSIC, Inst Tecnol Quim, Valencia 46022, Spain
[3] Univ Politecn Valencia, Inst Restauracio Patrimonil, Dept Conservac & Restauracio Bens Culturals, Valencia, Spain
关键词
D O I
10.1016/j.elecom.2006.07.042
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
Electrodeposition of copper from Cu/MOF immersed into acetate buffer produces a quasi-periodic series of 10-20 nm sized laminae sandwiched within the pristine MOF lattice as monitored by voltammetry of microparticles/atomic force microscopy. This anisotropic patterning can be qualitatively described in terms of a highly orientation-dependent diffusion of electrons and charge-balancing electrolyte counterions in the MOF network. (c) 2006 Elsevier B.V. All rights reserved.
引用
收藏
页码:1830 / 1834
页数:5
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