Formation of <111> fiber texture in β-SiC films deposited on Si(100) substrates

被引:43
作者
Radmilovic, Velimir [1 ]
Dahmen, Ulrich
Gao, Di
Stoldt, Conrad R.
Carraro, Carlo
Maboudian, Roya
机构
[1] Univ Calif Berkeley, Lawrence Berkeley Lab, Natl Ctr Electron Microscopy, Berkeley, CA 94720 USA
[2] Univ Calif Berkeley, Dept Chem Engn, Berkeley, CA 94720 USA
关键词
silicon carbide; chemical vapor deposition; nucleation; twinning; texture; intermediate layer; polar crystal growth model;
D O I
10.1016/j.diamond.2006.03.017
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The evolution of the morphology and the texture of 3C-SiC films grown by chemical vapor deposition (CVD), using 1,3-disilabutane as precursor, on Si(I 00) substrates is investigated by transmission electron microscopy. Films were found to exhibit a columnar grain structure with a strong < 111 > fiber texture and a high density of stacking faults and twins. The columnar grains do not originate at the substrate surface but on a buffer layer about 3 to 5 nm thick, consisting of interconnected 3D-islands that initiate as epitaxial nuclei. The change from < 100 > epitaxial islands to < 111 > columnar grains can be understood in terms of anisotropic growth rates and multiple twinning. The observed < 111 > fiber texture, faulted substructure, faceted surface morphology and carbon enrichment of the growth surface are in agreement with the proposed growth model. Published by Elsevier B.V.
引用
收藏
页码:74 / 80
页数:7
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