Thermal annealing behavior of α-Al2O3 scintillation screens

被引:4
作者
Lederer, S. [1 ,2 ]
Akhmadaliev, S. [3 ]
Forck, P. [1 ,4 ]
Guetlich, E. [1 ,4 ]
Lieberwirth, A. [1 ,2 ]
Ensinger, W. [2 ]
机构
[1] GSI Helmholtzzentrum Schwerionenforsch GmbH, D-64291 Darmstadt, Germany
[2] Tech Univ Darmstadt, D-64287 Darmstadt, Germany
[3] Helmholtz Zentrum Dresden Rossendorf, D-01328 Dresden, Germany
[4] Goethe Univ Frankfurt, D-60438 Frankfurt, Germany
关键词
Alumina; Heavy-ion irradiation; Color center; Thermal annealing; Scintillation screens; COLOR-CENTER FORMATION; OPTICAL-PROPERTIES; AL2O3; SAPPHIRE; DEFECTS; CENTERS;
D O I
10.1016/j.nimb.2015.08.024
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
Polycrystalline alumina samples (alpha-Al2O3, purity: 99.8%) were irradiated by C-63 heavy ions (E = 0.5 MeV/u) at various fluences. After irradiation, absorption measurements were performed within the wavelength range from 200 to 1000 nm to evaluate color center evolution. Thermal annealing behavior of the created defects was investigated with respect to annealing temperature and duration. Complex color center formation processes depending on particle fluence and temperature could be observed. Calculated activation energies necessary for F- and F+-center migration are similar to 0.3 eV for temperatures ranging from RT to similar to 673 K. (C) 2015 Elsevier B.V. All rights reserved.
引用
收藏
页码:548 / 552
页数:5
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