Magnetic properties of ultrathin laminated Co/Cu films prepared by electrodeposition

被引:29
作者
Shima, M [1 ]
Salamanca-Riba, L
McMichael, RD
Moffat, TP
机构
[1] Univ Maryland, Dept Mat & Nucl Engn, College Pk, MD 20742 USA
[2] NIST, Mat Sci & Engn Lab, Gaithersburg, MD 20899 USA
关键词
D O I
10.1149/1.1494826
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
The magnetic properties of a series of electrodeposited [Co (x ML)/Cu (17 ML)](100) multilayers have been examined as a function of the cobalt layer thickness. The multilayers were grown on Si(100) covered with a highly textured Cu(100) seed layer. Films with a cobalt layer thickness less than x < 1.7 monolayer equivalents (ML) exhibit superparamagnetic behavior due to the finite size of the cobalt islands comprising the discontinuous multilayer structure. In contrast, in films with x. 1.7 ML the lateral length scale becomes large enough to stabilize ferromagnetism and the giant magnetoresistance effect is observed. The influence of magnetocrystalline anisotropy is not apparent until 2.5 > x > 3.7 ML. The coercivity increases between 1.6 and 9 ML, reflecting the combined influence of the magnetocrystalline anisotropy and surface roughness. (C) 2002 The Electrochemical Society.
引用
收藏
页码:C439 / C444
页数:6
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