Dilute aluminum concentration in 4H-SiC :: from SIMS to LTPL measurements

被引:15
作者
Juillaguet, S
Zielinski, M
Balloud, C
Sartel, C
Consejo, C
Boyer, B
Soulière, V
Camassel, J
Monteil, Y
机构
[1] Univ Montpellier 2, Etud Semicond Grp, F-34095 Montpellier 5, France
[2] CNRS, F-34095 Montpellier, France
[3] Univ Lyon 1, Lab Multimat & Interfaces, F-69622 Villeurbanne, France
[4] Univ Montpellier 2, Serv Microsonde Sud, F-34095 Montpellier 5, France
来源
SILICON CARBIDE AND RELATED MATERIALS 2003, PRTS 1 AND 2 | 2004年 / 457-460卷
关键词
4H-SiC; photoluminescence; secondary ion mass spectroscopy (SIMS); aluminum;
D O I
10.4028/www.scientific.net/MSF.457-460.775
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
引用
收藏
页码:775 / 778
页数:4
相关论文
共 7 条
  • [1] ALUMINUM ACCEPTOR 4 PARTICLE BOUND EXCITON COMPLEX IN 4H, 6H, AND 3C SIC
    CLEMEN, LL
    DEVATY, RP
    MACMILLAN, MF
    YOGANATHAN, M
    CHOYKE, WJ
    LARKIN, DJ
    POWELL, JA
    EDMOND, JA
    KONG, HS
    [J]. APPLIED PHYSICS LETTERS, 1993, 62 (23) : 2953 - 2955
  • [2] DEVATY RP, 1997, PHYS STATUS SOLIDI A, P162
  • [3] Characterization of bulk and epitaxial SiC material using photoluminescence spectroscopy
    Henry, A
    Ellison, A
    Forsberg, U
    Magnusson, B
    Pozina, G
    Janzén, E
    [J]. SILICON CARBIDE AND RELATED MATERIALS 2001, PTS 1 AND 2, PROCEEDINGS, 2002, 389-3 : 593 - 596
  • [4] Nitrogen doping concentration as determined by photoluminescence in 4H- and 6H-SiC
    Ivanov, IG
    Hallin, C
    Henry, A
    Kordina, O
    Janzen, E
    [J]. JOURNAL OF APPLIED PHYSICS, 1996, 80 (06) : 3504 - 3508
  • [5] KASAMAKOVAKOLAK.L, TUP412
  • [6] 4H-SiC material for Hall effect and high-temperature sensors working in harsh environments
    Robert, JL
    Contreras, S
    Camassel, J
    Pernot, J
    Juillaguet, S
    Di Cioccio, L
    Billon, T
    [J]. SILICON CARBIDE AND RELATED MATERIALS 2001, PTS 1 AND 2, PROCEEDINGS, 2002, 389-3 : 1435 - 1438
  • [7] SARTEL C, THP15