Structural and optical properties of ZnO epitaxial films grown on Al2O3 (1120) substrates by metalorganic chemical vapor deposition

被引：8
|
作者：
Binh, NT
Zhang, BP
Liu, CY
Wakatsuki, K
Segawa, Y
Usami, N
Yamada, Y
Kawasaki, M
Koinuma, H
机构：
[1] RIKEN, Inst Phys & Chem Res, Photodynam Res Ctr, Aoba Ku, Sendai, Miyagi 9800845, Japan
[2] Tokyo Inst Technol, Mat & Struct Lab, Yokohama, Kanagawa 2268503, Japan
[3] Tohoku Univ, Inst Mat Res, Sendai, Miyagi 9808577, Japan
[4] Tonghua Teachers Coll, Dept Phys, Tonghua, Jilin, Peoples R China
[5] Tohoku Univ, Grad Sch Sci, Dept Phys, Sendai, Miyagi 9808578, Japan
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS | 2004年 / 43卷 / 7A期
关键词：
ZnO; MOCVD; OMVPE; Al2O3; epitaxial growth; surface morphology; X-ray diffraction; photoluminescence; exciton-exciton scattering; critical thickness;
D O I：
10.1143/JJAP.43.4110
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
ZnO films of different thicknesses were grown on Al2O3 (1120) substrates by metalorganic chemical vapor deposition. Characterizations using X-ray diffraction and scanning electron microscopy demonstrated the transition from two-dimensional growth to three-dimensional growth with an increase in film thickness. Photoluminescence spectra revealed the thickness dependence of the exciton peak and a stimulated emission due to exciton-exciton scattering was observed.
引用
收藏
页码：4110 / 4113
页数：4
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