Structural and optical properties of ZnO epitaxial films grown on Al2O3 (1120) substrates by metalorganic chemical vapor deposition

被引：8

作者：

Binh, NT

Zhang, BP

Liu, CY

Wakatsuki, K

Segawa, Y

Usami, N

Yamada, Y

Kawasaki, M

Koinuma, H

机构：

[1] RIKEN, Inst Phys & Chem Res, Photodynam Res Ctr, Aoba Ku, Sendai, Miyagi 9800845, Japan

[2] Tokyo Inst Technol, Mat & Struct Lab, Yokohama, Kanagawa 2268503, Japan

[3] Tohoku Univ, Inst Mat Res, Sendai, Miyagi 9808577, Japan

[4] Tonghua Teachers Coll, Dept Phys, Tonghua, Jilin, Peoples R China

[5] Tohoku Univ, Grad Sch Sci, Dept Phys, Sendai, Miyagi 9808578, Japan

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS | 2004年 / 43卷 / 7A期

关键词：

ZnO; MOCVD; OMVPE; Al2O3; epitaxial growth; surface morphology; X-ray diffraction; photoluminescence; exciton-exciton scattering; critical thickness;

D O I：

10.1143/JJAP.43.4110

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

ZnO films of different thicknesses were grown on Al2O3 (1120) substrates by metalorganic chemical vapor deposition. Characterizations using X-ray diffraction and scanning electron microscopy demonstrated the transition from two-dimensional growth to three-dimensional growth with an increase in film thickness. Photoluminescence spectra revealed the thickness dependence of the exciton peak and a stimulated emission due to exciton-exciton scattering was observed.

引用

页码：4110 / 4113

页数：4

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