Layer-by-layer self-assembly of reactive polyelectrolytes for robust multilayer patterning

被引:2
|
作者
Shi, F [1 ]
Dong, B [1 ]
Qiu, DL [1 ]
Sun, JQ [1 ]
Wu, T [1 ]
Zhang, X [1 ]
机构
[1] Jilin Univ, Dept Chem, Key Lab Supramol Struct & Mat, Changchun 130023, Peoples R China
关键词
D O I
10.1002/1521-4095(20020605)14:11<805::AID-ADMA805>3.0.CO;2-O
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
A way of fabricating robust multilayer patterns is presented. The scheme takes advantage of the solubility difference of the photo-reactive multilayer before and after UV irradiation. Patterns produced are applicable in rigorous conditions, such as in solutions of high ionic strength, or as matrices for inducing further pattern formation.
引用
收藏
页码:805 / 809
页数:5
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