Nanoscale electrical properties of cluster-assembled palladium oxide thin films

被引：14

作者：

Cassina, V. ^{[1
,2
]}

Gerosa, L. ^{[3
]}

Podesta, A. ^{[1
,2
]}

Ferrari, G. ^{[3
]}

Sampietro, M. ^{[3
]}

Fiorentini, F. ^{[1
,2
]}

Mazza, T. ^{[1
,2
]}

Lenardi, C. ^{[2
,4
]}

Milani, P. ^{[1
,2
]}

机构：

[1] Univ Milan, Dipartimento Fis, I-20133 Milan, Italy

[2] Univ Milan, CIMaINa, I-20133 Milan, Italy

[3] Politecn Milan, Dipartimento Elettron & Informaz, I-20133 Milan, Italy

[4] Univ Milan, Ist Fisiol Gen & Chim Biol, I-20134 Milan, Italy

来源：

PHYSICAL REVIEW B | 2009年 / 79卷 / 11期

关键词：

atomic force microscopy; nanostructured materials; palladium compounds; permittivity; thin films; X-ray photoelectron spectra; ATOMIC-FORCE MICROSCOPY; SCANNING CAPACITANCE MICROSCOPY; PROBE MICROSCOPY; DEPOSITION; PDO;

D O I：

10.1103/PhysRevB.79.115422

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The electrical properties of cluster-assembled nanostructured palladium oxide (ns-PdOx) thin films grown by supersonic cluster beam deposition have been characterized by means of a customized ac current-sensing atomic force microscope. Scanning impedance microscopy is shown to provide a deep picture of the electrical properties of thin nanostructured interfaces even in the case of very soft and poorly adherent films. In particular, the dielectric constant of ns-PdOx can be quantitatively determined as well as its I-V characteristics. Moreover, the measurement of the tip-sample parasitic capacitance can be exploited to probe the overall mesoscale conductive character of thin films and to give a complementary and more precise view of the oxidation of ns-PdOx obtained by x-ray photoemission spectroscopy.

引用

页数：8

共 37 条

[1] A pulsed microplasma source of high intensity supersonic carbon cluster beams [J].