Effect of ultraviolet light irradiation on amorphous carbon nitride films

被引：49

作者：

Zhang, M

Nakayama, Y

机构：

[1] Dept. of Physics and Electronics, Osaka Prefecture University

来源：

JOURNAL OF APPLIED PHYSICS | 1997年 / 82卷 / 10期

关键词：

D O I：

10.1063/1.366356

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The amorphous carbon nitride films were produced using electron cyclotron resonance nitrogen plasma with various mixtures of N-2 and CH4 gases. The dependence of film structures on the nitrogen incorporation and the structural modifications of the film due to ultraviolet (UV)light irradiation were investigated using infrared and UV-VIS spectroscopy. It is found that UV irradiation results in the decrease of CH bonding, increase of CC and CN double bonding, in the film and increase of the optical band gap of the film. It appears that both bond removal and reordering have taken place as a result of UV irradiation. The structural modifications due to nitrogen incorporation and UV light irradiation are explained by a cluster model. (C) 1997 American Institute of Physics.

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页码：4912 / 4915

页数：4

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