Surface analysis and mechanical behaviour mapping of vertically aligned CNT forest array through nanoindentation

被引:14
作者
Koumoulos, Elias P. [1 ]
Charitidis, C. A. [1 ]
机构
[1] Natl Tech Univ Athens, Sch Chem Engn, RNanolab, 9 Heroon Polytechniou St, Athens 15780, Greece
基金
欧盟地平线“2020”;
关键词
Carbon nanotube structures; Chemical vapor deposiion; Nanomechanical behavior; Hydrophobicity; Mapping; Integrity; CARBON NANOTUBES; YOUNGS MODULUS; SINGLE-WALL; STRENGTH; STRESS; GROWTH; ENERGY; MWCNT;
D O I
10.1016/j.apsusc.2016.11.008
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Carbon nanotube (CNT) based architectures have increased the scientific interest owning to their exceptional performance rendering them promising candidates for advanced industrial applications in the nanotechnology field. Despite individual CNTs being considered as one of the most known strong materials, much less is known about other CNT forms, such as CNT arrays, in terms of their mechanical performance (integrity). In this work, thermal chemical vapor deposition (CVD) method is employed to produce vertically aligned multiwall (VA-MW) CNT carpets. Their structural properties were studied by means of scanning electron microscopy (SEM), X-Ray diffraction (XRD) and Raman spectroscopy, while their hydrophobic behavior was investigated via contact angle measurements. The resistance to indentation deformation of VA-MWCNT carpets was investigated through nanoindentation technique. The synthesized VA-MWCNTs carpets consisted of well-aligned MWCNTs. Static contact angle measurements were performed with water and glycerol, revealing a rather super-hydrophobic behavior. The structural analysis, hydrophobic behavior and indentation response of VA-MWCNTs carpets synthesized via CVD method are clearly demonstrated. Additionally, cycle indentation load-depth curve was applied and hysteresis loops were observed in the indenter loading-unloading cycle due to the local stress distribution. Hardness (as resistance to applied load) and modulus mapping, at 200 nm of displacement for a grid of 70 mu m(2) is presented. Through trajection, the resistance is clearly divided in 2 regions, namely the MWCNT probing and the in-between area MWCNT - MWCNT interface. (C) 2016 Elsevier B.V. All rights reserved.
引用
收藏
页码:681 / 687
页数:7
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