Molecular beam epitaxy growth and characterization of self-assembled InAs quantum dots on (100) InAlAs/InP substrates

被引:0
作者
Koo, BH
Park, YG
Makino, H
Chang, JH
Hanada, T
Shindo, D
Yao, T
机构
[1] Tohoku Univ, Mat Res Inst, Yao Lab, Aoba Ku, Sendai, Miyagi 9808577, Japan
[2] Tohoku Univ, Inst Multidisciplinary Res Adv Mat, Aoba Ku, Sendai, Miyagi 9808577, Japan
关键词
InAs quantum dots; MBE; TEM; PL;
D O I
10.1016/S0169-4332(01)00876-5
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Self-assembled InAs quantum dots (QDs) on In0.52Al0.48As layer lattice matched to (1 0 0) InP substrates have been grown by molecular beam epitaxy (MBE) and evaluated by transmission electron microscopy (TEM) and photoluminescence (PL), TEM observations indicate that defect-free InAs QDs can be grown to obtain emissions over the technologically important 1.3-1.55 mum region. The PL peak positions for the QDs shift to low energy as the InAs coverage increases, corresponding to increase in QD size. The room temperature PL peak at 1.58 mum was observed from defect-free InAs QDs with average dot height of 3.6 nm. (C) 2002 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:226 / 230
页数:5
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