Real-time measurement of reactive process gases in microelectronics by means of FTIR spectroscopy

被引：0
作者：
Mohn, Joachim [1 ]
Galli, Rene
Emmenegger, Lukas
机构：
[1] Swiss Fed Labs Mat Testing & Res, Empa, Lab Air Pollut Environm Technol, CH-8600 Dubendorf, Switzerland
[2] BMG Engn AG, CH-8952 Schlieren, Switzerland
来源：
CHEMIE INGENIEUR TECHNIK | 2006年 / 78卷 / 10期
关键词：
D O I：
10.1002/cite.200600037
中图分类号：
TQ [化学工业];
学科分类号：
0817 ;
摘要：
[No abstract available]
引用
收藏
页码：1524 / 1530
页数：7
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