Reducing the stress concentration of back contact solar cells: Optimizing the process of drilling

被引:1
|
作者
Ma, Xiao-Bo [1 ]
Zhang, Wei-Jia [1 ]
Ma, Qiang [1 ]
Fan, Zhi-Qiang [1 ]
Ma, Deng-Hao [1 ]
机构
[1] Beihang Univ, Sch Phys & Nucl Energy Engn, Mat Phys & Chem Res Ctr, Beijing 100191, Peoples R China
基金
中国国家自然科学基金;
关键词
Back contact solar cells; Finite element; Drilling; Stress concentration; SILICON; WRAP;
D O I
10.1016/j.mee.2015.12.001
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Drilling is important for back contact solar cells, which form a good ohmic contact between a front surface and a rear surface. However, drilling causes increases of breakages and cracks in a back contact solar cell when the silicon wafer is thinner and larger than that of conventional cells. In the present paper, the node value method of finite element post-processing, including a stress concentration factor, a Von Mises stress and a sub-model, is used to achieve a quantitative analysis involving the stress concentration of a silicon wafer with multiple holes under thin film residual stress. The results show that drilling which changes the stress field distribution in a silicon wafer generates a stress concentration around the holes. This stress concentration can be reduced by increasing the thickness of a silicon wafer, decreasing the drilling ratio and replacing the morphologies of trapezoidal holes with those of cylindrical holes. The results of the simulation are in accordance with the experimental results adopted by Raman spectra and three-point bending tests. Our results provide a beneficial reference for decreasing stress concentration in back contact solar cells. (C) 2015 Elsevier B.V. All rights reserved.
引用
收藏
页码:53 / 59
页数:7
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