Investigation of Single Event Transient Effects in Junctionless Accumulation Mode MOSFET

被引:13
作者
Dubey, Avashesh [1 ]
Narang, Rakhi [1 ,2 ]
Saxena, Manoj [3 ]
Gupta, Mridula [1 ]
机构
[1] Univ Delhi, Dept Elect Sci, Semicond Device Res Lab, South Campus, New Delhi 110021, India
[2] Univ Delhi, Sri Venkateswara Coll, Dept Elect, New Delhi 110021, India
[3] Univ Delhi, Deen Dayal Upadhyaya Coll, Dept Elect, New Delhi 110078, India
关键词
MOSFET; Transient analysis; Single event transients; Doping; Logic gates; Junctionless; accumulation mode MOSFET; double gate; LET; single event transient; single event upset; radiation reliability; NUMERICAL-SIMULATION; BULK FINFETS; GATE; TRANSISTORS; DAMAGE;
D O I
10.1109/TDMR.2020.3014176
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The Junctionless Accumulation Mode Double Gate MOSFET (JAM DG MOSFET) is a promising novel architecture for future nano-scaled devices because of its outstanding electrical characteristics, e.g., lower subthreshold swing, lower drain induced barrier lowering, i.e., lower short channel effects and higher I-ON/I-OFF ratio. In this paper, a comprehensive analysis of the effects of single-event transient on JAM DG MOSFET has been performed using the sentaurus TCAD simulator. The result shows that the transient drain current peak obtained after the heavy-ion strike for JAM DG MOSFET is small at lower value linear energy transfer (LET) and high for the larger value of LET. Collected charge at different LET values has also been investigated. Moreover, the sensitive region of the device, e.g., source to channel junction, channel, and channel to drain junction has been studied. It has been found that the drain to channel junction is more sensitive to the linear energy than the channel and source to channel junction. The electrical characteristics have also been compared with JL DG MOSFET.
引用
收藏
页码:604 / 608
页数:5
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