Large-area high-quality single crystal diamond

被引:99
作者
Schreck, Matthias [1 ]
Asmussen, Jes [2 ]
Shikata, Shinichi [3 ]
Arnault, Jean-Charles
Fujimori, Naoji
机构
[1] Univ Augsburg, Inst Phys, Augsburg, Germany
[2] Michigan State Univ, E Lansing, MI 48824 USA
[3] Natl Inst Adv Ind Sci & Technol, Tsukuba, Ibaraki, Japan
关键词
CHEMICAL-VAPOR-DEPOSITION; HIGH GROWTH-RATE; RATE HOMOEPITAXIAL GROWTH; HETEROEPITAXIAL DIAMOND; ELECTRON-MICROSCOPY; EPITAXIAL-GROWTH; HIGH-PRESSURE; FILMS; NUCLEATION; IRIDIUM;
D O I
10.1557/mrs.2014.96
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Diamond offers a unique combination of extreme physical properties. For many technological applications, diamond samples of the highest crystal quality are required to utilize the ultimate potential of the material. Specifically, grain boundaries, as in polycrystalline films, have to be avoided. In this article, the two major current approaches of synthesizing single crystal diamond by chemical vapor deposition are described. In homoepitaxy, high gas pressure and high power density microwave discharges facilitating growth rates above 50 mu m/h form the basis for the deposition of mm-thick single crystal samples. Cloning and tiling followed by homoepitaxial overgrowth are promising novel concepts aimed at an increase in the lateral dimensions. Heteroepitaxial deposition on large-area single crystals of a foreign material represents a second alternative approach. The state of the art for both concepts is summarized, and current as well as potential future applications are discussed.
引用
收藏
页码:504 / 510
页数:7
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