Growth of InAs/InP-based quantum dots for 1.55 μm laser applications

被引:89
作者
Poole, P. J. [1 ]
Kaminska, K. [1 ]
Barrios, P. [1 ]
Lu, Z. [1 ]
Liu, J. [1 ]
机构
[1] Natl Res Council Canada, Inst Microstruct Sci, Ottawa, ON K1A 0R6, Canada
关键词
Nanostructures; Chemical beam epitaxy; Semiconducting III-V materials; Laser diodes; TEMPERATURE; THRESHOLD; GAAS;
D O I
10.1016/j.jcrysgro.2009.01.129
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
Photoluminescence and scanning electron microscopy have been used to study the growth of InAs quantum dots with InGaAsP barriers on (0 0 1) InP substrates for 1.55 mu m laser applications. The effect of growing quantum dots on a thin GaP layer as well as the use of a two step dot capping procedure was investigated, optimising for dot density, emission energy, and photoluminescence emission full-width half-maximum. It was found that the emission energy of a dot layer could be tuned around the important 1.55 mu m wavelength range while maintaining a high dot density and narrow dot size distribution, even when stacking multiple layers. An optimised dot structure was then used as the core of a single lateral mode laser diode demonstrating continuous wave operation at room temperature with a threshold of 25.9 mA and slope efficiency of 0.3 A/W. Crown Copyright (C) 2009 Published by Elsevier B.V. All rights reserved.
引用
收藏
页码:1482 / 1486
页数:5
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