Embedded atom model calculations of the diffusion coefficient of Ni impurity in liquid Al

被引：10

作者：

Alemany, MMG ^{[1
]}

Rey, C ^{[1
]}

Gallego, LJ ^{[1
]}

机构：

[1] Univ Santiago de Compostela, Fac Fis, Dept Fis Mat Condensada, E-15706 Santiago De Compostela, Spain

来源：

JOURNAL OF CHEMICAL PHYSICS | 1999年 / 111卷 / 19期

关键词：

D O I：

10.1063/1.480252

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

[No abstract available]

引用

页码：9111 / 9112

页数：2

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