Adhesion characteristics of Cu/Ni-Cr/polyimide flexible copper clad laminates according to Ni:Cr ratio and Cu electroplating layer thickness

被引:23
作者
Noh, Bo-In [1 ]
Yoon, Jeong-Won [1 ]
Lee, Bo-Young [2 ]
Jung, Seung-Boo [1 ]
机构
[1] Sungkyunkwan Univ, Sch Adv Mat Sci & Engn, Suwon 440746, Gyeonggi Do, South Korea
[2] Korea Aerosp Univ, Dept Aerosp & Mech Engn, Koyang 412791, Gyeonggi Do, South Korea
关键词
CU/CR/POLYIMIDE SYSTEM; POLYIMIDE; FILMS; INTERFACE; STRENGTH; ENERGY; PLASMA;
D O I
10.1007/s10854-008-9811-1
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The adhesion strength of Cu/Ni-Cr/polyimide flexible copper clad laminate (FCCL) was evaluated according to the composition ratio of the Ni-Cr layer and the thickness of the Cu electroplating layer, by using a 90A degrees peel test. The changes in the morphology, chemical bond and adhesion property were characterized by scanning electron microscopy (SEM), atomic force microscopy (AFM) and X-ray photoelectron spectroscopy (XPS). The peel strength of the FCCL increased with increasing Cr content and increasing Cu electroplating layer thickness. This increasing FCCL peel strength was attributed to a lower C-N bond and higher C-O and carbonyl (C=O) bonds in the polyimide surface compared to the FCCL with a lower adhesion strength. The adhesion property of the FCCLs was significantly affected by the Ni:Cr ratio.
引用
收藏
页码:885 / 890
页数:6
相关论文
共 13 条
[1]   Effects of heat treatment at 350°C on the adhesion of Cu-Cr alloy films to polyimide [J].
Ahn, EC ;
Yu, J ;
Park, IS .
JOURNAL OF MATERIALS SCIENCE, 2000, 35 (08) :1949-1955
[2]   Low cost flex substrates for miniaturized electronic assemblies [J].
Barlow, F ;
Lostetter, A ;
Elshabini, A .
MICROELECTRONICS RELIABILITY, 2002, 42 (07) :1091-1099
[3]   Tantalum, tantalum nitride, and chromium adhesion to polyimide: effect of annealing ambient on adhesion [J].
Buchwalter, LP ;
Holloway, K .
JOURNAL OF ADHESION SCIENCE AND TECHNOLOGY, 1998, 12 (01) :95-104
[4]   AN XPS AND TEM STUDY OF INTRINSIC ADHESION BETWEEN POLYIMIDE AND CR FILMS [J].
CHOU, NJ ;
DONG, DW ;
KIM, J ;
LIU, AC .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1984, 131 (10) :2335-2340
[5]   Plasma surface treatment of polyimide for adhesive Cu/80Ni20Cr/PI flexible copper clad laminate [J].
Eom, Jun Sun ;
Kim, Sang Ho .
THIN SOLID FILMS, 2008, 516 (14) :4530-4534
[6]   COMPLEX-FORMATION AND GROWTH AT THE CR-POLYIMIDE AND CU-POLYIMIDE INTERFACE [J].
HAIGHT, R ;
WHITE, RC ;
SILVERMAN, BD ;
HO, PS .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1988, 6 (04) :2188-2199
[7]   SYNCHROTRON-RADIATION EXCITED CARBON 1S PHOTOEMISSION-STUDY OF CR-ORGANIC POLYMER INTERFACES [J].
JORDAN, JL ;
SANDA, PN ;
MORAR, JF ;
KOVAC, CA ;
HIMPSEL, FJ ;
POLLAK, RA .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1986, 4 (03) :1046-1048
[8]   Adhesion energy of Cu/polyimide interface in flexible printed circuits [J].
Kamiya, Shoji ;
Furuta, Harunori ;
Omiya, Masaki .
SURFACE & COATINGS TECHNOLOGY, 2007, 202 (4-7) :1084-1088
[9]   Effect of surface roughness on the adhesion properties of Cu/Cr films on polyimide substrate treated by inductively coupled oxygen plasma [J].
Kim, SH ;
Na, SW ;
Lee, NE ;
Nam, YW ;
Kim, YH .
SURFACE & COATINGS TECHNOLOGY, 2005, 200 (07) :2072-2079
[10]   The effects of Cr oxidation and polyimide degradation on interface adhesion strength in Cu/Cr/polyimide flexible films [J].
Miyamura, T. ;
Koike, J. .
MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING, 2007, 445 :620-624