Behaviour of nickel and nickel oxide thin films in chloride media

被引：0
作者：
Magana, C. R. [1 ]
Angeles, M. E. [1 ]
Rodriguez, F. J. [1 ]
机构：
[1] Univ Nacl Autonoma Mexico, Fac Quim, Dept Met, Mexico City 04510, DF, Mexico
来源：
REVISTA DE METALURGIA | 2006年 / 42卷 / 01期
关键词：
nickel; nickel oxide; magnetron DC sputtering; chloride media;
D O I：
暂无
中图分类号：
TF [冶金工业];
学科分类号：
0806 ;
摘要：
The aim of this work is to study the behaviour of both: a nickel thin film deposited on steel AISI 1018 (UNS G 10180) and a superior nickel oxide electrochemically obtained on the film; with the purpose of decreasing the corrosion rate of low carbon steel immersed in a solution of NaCl 3% wt, thus efficient anticorrosive protection could be obtained. Two film deposition techniques were used: electrochemical and magnetron DC sputtering; and the protective properties of deposited films exposed to the aggressive media, were evaluated. The characterization of different films was carried out by using electrochemical techniques: polarization curves and electrochemical impedance.
引用
收藏
页码：49 / 55
页数：7
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